{"id":233924,"date":"2024-10-19T15:15:22","date_gmt":"2024-10-19T15:15:22","guid":{"rendered":"https:\/\/pdfstandards.shop\/product\/uncategorized\/bs-iec-63068-12019\/"},"modified":"2024-10-25T09:46:39","modified_gmt":"2024-10-25T09:46:39","slug":"bs-iec-63068-12019","status":"publish","type":"product","link":"https:\/\/pdfstandards.shop\/product\/publishers\/bsi\/bs-iec-63068-12019\/","title":{"rendered":"BS IEC 63068-1:2019"},"content":{"rendered":"
IEC 63068-1:2019(E) gives a classification of defects in as-grown 4H-SiC (Silicon Carbide) epitaxial layers. The defects are classified on the basis of their crystallographic structures and recognized by non-destructive detection methods including bright-field OM (optical microscopy), PL (photoluminescence), and XRT (X-ray topography) images.<\/p>\n
PDF Pages<\/th>\n | PDF Title<\/th>\n<\/tr>\n | ||||||
---|---|---|---|---|---|---|---|
2<\/td>\n | undefined <\/td>\n<\/tr>\n | ||||||
4<\/td>\n | CONTENTS <\/td>\n<\/tr>\n | ||||||
5<\/td>\n | FOREWORD <\/td>\n<\/tr>\n | ||||||
7<\/td>\n | INTRODUCTION <\/td>\n<\/tr>\n | ||||||
8<\/td>\n | 1 Scope 2 Normative references 3 Terms and definitions <\/td>\n<\/tr>\n | ||||||
12<\/td>\n | 4 Classification of defects 4.1 General <\/td>\n<\/tr>\n | ||||||
13<\/td>\n | 4.2 Description of the defect classes 4.2.1 Examples of defects 4.2.2 Point defect 4.2.3 Micropipe Table 1 \u2013 Classification of defects <\/td>\n<\/tr>\n | ||||||
14<\/td>\n | 4.2.4 TSD Figures Figure 1 \u2013 Micropipe <\/td>\n<\/tr>\n | ||||||
15<\/td>\n | 4.2.5 TED Figure 2 \u2013 TSD <\/td>\n<\/tr>\n | ||||||
16<\/td>\n | 4.2.6 BPD Figure 3 \u2013 TED <\/td>\n<\/tr>\n | ||||||
17<\/td>\n | 4.2.7 Scratch trace Figure 4 \u2013 BPD <\/td>\n<\/tr>\n | ||||||
18<\/td>\n | 4.2.8 Stacking fault Figure 5 \u2013 Scratch trace <\/td>\n<\/tr>\n | ||||||
19<\/td>\n | 4.2.9 Propagated stacking fault Figure 6 \u2013 Stacking fault <\/td>\n<\/tr>\n | ||||||
20<\/td>\n | 4.2.10 Stacking fault complex Figure 7 \u2013 Propagated stacking fault <\/td>\n<\/tr>\n | ||||||
21<\/td>\n | 4.2.11 Polytype inclusion Figure 8 \u2013 Stacking fault complex <\/td>\n<\/tr>\n | ||||||
22<\/td>\n | 4.2.12 Particle inclusion Figure 9 \u2013 Polytype inclusion <\/td>\n<\/tr>\n | ||||||
23<\/td>\n | 4.2.13 Bunched-step segment Figure 10 \u2013 Particle inclusion <\/td>\n<\/tr>\n | ||||||
24<\/td>\n | 4.2.14 Surface particle 4.2.15 Others Figure 11 \u2013 Bunched-step segment <\/td>\n<\/tr>\n | ||||||
25<\/td>\n | Bibliography <\/td>\n<\/tr>\n<\/table>\n","protected":false},"excerpt":{"rendered":" Semiconductor devices. Non-destructive recognition criteria of defects in silicon carbide homoepitaxial wafer for power devices – Classification of defects<\/b><\/p>\n |