BS EN 62047-4:2010
$142.49
Semiconductor devices. Micro-electromechanical devices – Generic specification for MEMS
Published By | Publication Date | Number of Pages |
BSI | 2010 | 24 |
IEC 62047-4:2008 describes the generic specifications for micro-electromechanical systems (MEMS) made by semiconductors, which are the basis for specifications given in other parts of this series for various types of MEMS applications such as sensors, RF MEMS, excluding optical MEMS, bio MEMS, micro TAS, and power MEMS. This standard specifies general procedures for quality assessment to be used in IECQ-CECC systems and establishes general principles for describing and testing of electrical, optical, mechanical and environmental characteristics. IEC 62047-4:2008 aids in the preparation of standards that define devices and systems made by micromachining technology, including but not limited to, material characterization and handling, assembly and testing, process control and measuring methods. MEMS described in this standard are basically made of semiconductor material. However, the statements made in this standard are also applicable to MEMS using materials other than semiconductor, for example, polymers, glass, metals and ceramic materials.
PDF Catalog
PDF Pages | PDF Title |
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6 | English CONTENTS |
7 | 1 Scope 2 Normative references |
8 | 3 Terms, definitions, units and symbols Table 1 – MEMS categories and terms |
9 | 4 Standard environmental conditions 5 Marking 5.1 Device identification 5.2 Device traceability 5.3 Packing 6 Quality assessment procedures 6.1 General |
10 | 6.2 Qualification approval procedure |
12 | Table 2 – Subgrouping for Group B and Group C |
14 | 7 Test and measurement procedures 7.1 Standard conditions and general precautions |
15 | 7.2 Physical examination 7.3 Climatic and mechanical tests 7.4 Alternative test methods |
16 | Annex A (normative) Sampling procedures |
17 | Annex B (informative) Classification for MEMS technologies and devices |
21 | Bibliography |